On the parameters of inductively coupled and microwave BF3 plasmas used for plasma immersion ion implantation

Plasma Processes and Polymers

Volumn 2, Issue 6, 2005, Pages 472-479

  Sukhanov, Yakov N ^a   Ershov, Alexey P ^b   Rudenko, Konstantin V ^a   Orlikovsky, Alexander A ^a  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

Boron trifluoride; Inductively coupled plasmas; Langmuir probes; Microwave discharges

Indexed keywords

ARGON; COMPOSITION; DEPOSITION; ELECTRONS; INDUCTIVELY COUPLED PLASMA; ION IMPLANTATION; MICROWAVES; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS; PLASMA PROBES; PLASMA SOURCES; THERMAL EFFECTS;

ARGON DISCHARGES; BORON TRIFLUORIDE; DISCHARGE CONDITIONS; LANGMUIR PROBES; MICROWAVE DISCHARGES; MICROWAVE PLASMAS; PLASMA IMMERSION ION IMPLANTATION;

BORON COMPOUNDS;

EID: 23144442869     PISSN: 16128850     EISSN: None     Source Type: Journal    
DOI: 10.1002/ppap.200500006     Document Type: Article

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