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Applied Surface Science

Volumn 192, Issue 1-4, 2002, Pages 115-134

Negative ions in processing plasmas and their effect on the plasma structure

(1) Kono, Akihiro a

a NAGOYA UNIVERSITY (Japan)

Author keywords

Ambipolar diffusion; Electronegative plasma; Negative ion; Photodetachment; Sheath

Indexed keywords

CARRIER CONCENTRATION; COMPUTER SIMULATION; DAMPING; ELECTRODES; NEGATIVE IONS; RATE CONSTANTS;

ELECTRON ATTACHMENTS; ELECTRONEGATIVE PLASMAS;

INDUCTIVELY COUPLED PLASMA;

EID: 0037198341 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(02)00023-5 Document Type: Conference Paper

Times cited : (47)

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