Mechanism and modeling of ring pattern formation for electron beam exposure on zwitterresist

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3838-3841

  Chen, Jem Kun ^a   Ko, Fu Hsiang ^a   Chen, Hsuen Li ^a   Chang, Feng Chih ^b  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Electron beam; Heating effect; Ring pattern; Throughput; Zwitterresist

Indexed keywords

ELECTRON BEAMS; ELECTRON SCATTERING; HEATING; MATHEMATICAL MODELS; SENSITIVITY ANALYSIS; THROUGHPUT;

ZWITTERRESISTS;

PHOTORESISTS;

EID: 0042864448     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3838     Document Type: Conference Paper

References (4)

1. R. N. Castellano: Solid State Technol. 45 (2002) 44.
2. Semiconductor Industry Association, International Technology Roadmap for Semiconductor 2001 (SIA publication, Texas, 2001).
3. F.-H. Ko, J.-K. Chen, C.-T. Pan and H.-L. Chen: Proc. 46th Int. Conf. Electron, Ion and Photo Beam Technology and Nanofabrication, 46th EIPBN (2002) p. 201.
4. L. F. Thompson, C. G. Wilson and M. J. Bowden: Introduction to Microlithography (ACS publications, Washington DC, 1994) Chap 2.