Interstitial oxygen molecules in amorphous SiO 2. I. Quantitative concentration analysis by thermal desorption, infrared photoluminescence, and vacuum-ultraviolet optical absorption

Journal of Applied Physics

Volumn 98, Issue 1, 2005, Pages

  Kajihara, Koichi ^a   Hirano, Masahiro ^a   Uramoto, Motoko ^b   Morimoto, Yukihiro ^b   Skuja, Linards ^c   Hosono, Hideo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b USHIO INC   (Japan)

^c UNIVERSITY OF LATVIA   (Latvia)

Author keywords

[No Author keywords available]

Indexed keywords

INFRARED PHOTOLUMINESCENCE; PHOTOEXCITATION; THERMAL DESORPTION; VACUUM-ULTRAVIOLET;

AMORPHOUS MATERIALS; ANNEALING; CONCENTRATION (PROCESS); DESORPTION; LIGHT ABSORPTION; OXYGEN; PHOTOLUMINESCENCE; SPECTROSCOPIC ANALYSIS; ULTRAVIOLET RADIATION; VACUUM;

SILICA;

EID: 22944484439     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1943504     Document Type: Article

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