The behavior of interstitial oxygen atoms induced by F2 laser irradiation of oxygen-rich glassy SiO2

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 191, Issue 1-4, 2002, Pages 127-130

  Skuja, L ^a,b   Kajihara, K ^a   Kinoshita, T ^b   Hirano, M ^a   Hosono, H ^a,b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Oxygen interstitials; Photolysis; Silica

Indexed keywords

ATOMS; LASER BEAM EFFECTS; MOLECULES; PHOTOLUMINESCENCE; PHOTOLYSIS; SILICA; THERMAL EFFECTS;

OXYGEN INTERSTITIALS;

OXYGEN;

EID: 0036574687     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00525-6     Document Type: Article

References (12)