Study on characterizing fluorocarbon polymer films deposited on an inner surface during high-aspect-ratio contact hole etching using secondary ion mass spectroscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 2, 1999, Pages 355-361

  Liu, Quo Lin ^a   Ikegami, Naokatu ^a   Uchida, Hidetsugu ^a   Hirashita, Norio ^a   Kanamori, Jun ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644450767     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590563     Document Type: Article

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