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Volumn 17, Issue 4, 1999, Pages 1346-1349
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High temperature reaction of nitric oxide with Si surfaces: Formation of Si nanopillars through nitride masking and oxygen etching
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 22644448747
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.590758 Document Type: Article |
Times cited : (4)
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References (19)
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