Photo-chemical processing of vacuum deposited alumina thin films

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 3, 2005, Pages 1353-1357

  Starbova, K ^a   Krumov, E ^a   Popov, D ^b   Schlaghecken, G ^c   Kreutz, E W ^c  

^a CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

^b BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^c RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Alumina thin films; Electroless plating; Excimer laser irradiation

Indexed keywords

ALUMINA; ALUMINUM OXIDE; CATALYST ACTIVITY; CHEMICAL INDUSTRY; ELECTROLESS PLATING; ENERGY DISPERSIVE X RAY ANALYSIS; EXCIMER LASERS; IRRADIATION; LASER CHEMISTRY; NICKEL; OPTICAL FILMS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAYS;

ALUMINA THIN FILMS; CHEMICAL PROCESSING; ELECTROLESS NI PLATING; HETEROGENEOUS CATALYST; IRRADIATED FILMS; LASER ENERGY DENSITY; OPTICAL SPECTROPHOTOMETRY; STAINLESS STEEL SUBSTRATES;

THIN FILMS;

EID: 22544445268     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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