메뉴 건너뛰기




Volumn 15, Issue 8, 2005, Pages 1466-1475

MEMS variable optical attenuator using a translation motion of 45° tilted vertical mirror

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; LIGHT MODULATION; LIGHT POLARIZATION; MICROELECTROMECHANICAL DEVICES; MIRRORS; WAVELENGTH DIVISION MULTIPLEXING;

EID: 22544440635     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/8/013     Document Type: Article
Times cited : (19)

References (16)
  • 2
    • 0033080136 scopus 로고    scopus 로고
    • A variable optical attenuator based on silicon micromechanics
    • Marxer C, Griss P and de Rooij N F 1999 A variable optical attenuator based on silicon micromechanics IEEE Photon. Technol. Lett. 11 233-5
    • (1999) IEEE Photon. Technol. Lett. , vol.11 , Issue.2 , pp. 233-235
    • Marxer, C.1    Griss, P.2    De Rooij, N.F.3
  • 6
    • 0033656154 scopus 로고    scopus 로고
    • MEMS variable optical attenuator for DWDM optical amplifiers
    • Andersen B M, Fairchild S and Thorsten N 2000 MEMS variable optical attenuator for DWDM optical amplifiers Opt. Fiber Commun. 2 260-2
    • (2000) Opt. Fiber Commun. , vol.2 , pp. 260-262
    • Andersen, B.M.1    Fairchild, S.2    Thorsten, N.3
  • 7
    • 0037090638 scopus 로고    scopus 로고
    • Fault-tolerant three-port fiber-optic attenuator using small tilt micro mirror device
    • Sumriddetchkajorn S and Riza N A 2002 Fault-tolerant three-port fiber-optic attenuator using small tilt micro mirror device Opt. Commun. 205 77-86
    • (2002) Opt. Commun. , vol.205 , Issue.1-3 , pp. 77-86
    • Sumriddetchkajorn, S.1    Riza, N.A.2
  • 10
    • 22544460136 scopus 로고    scopus 로고
    • www.santec.com
  • 11
    • 22544458082 scopus 로고    scopus 로고
    • www.sercalo.com
  • 12
    • 22544460698 scopus 로고    scopus 로고
    • www.diconfiber.com
  • 15
    • 14244258959 scopus 로고    scopus 로고
    • Prevention method of a notching caused by surface charging in silicon reactive ion etching
    • Kim C-H and Kim Y-K 2005 Prevention method of a notching caused by surface charging in silicon reactive ion etching J. Micromech. Microeng. 15 358-61
    • (2005) J. Micromech. Microeng. , vol.15 , Issue.2 , pp. 358-361
    • Kim, C.-H.1    Kim, Y.-K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.