The effects of oxygen partial pressure on (Ba, Sr)TiO3 thin films deposited on RuO2 bottom electrodes

Journal of Materials Science Letters

Volumn 17, Issue 2, 1998, Pages 95-98

  Paek, Su Hyon ^a   Lee, Kong Soo ^a   Sung, Jin Yong ^a   Son, Seung Yong ^a   Park, Chi Sun ^b   Chung, Ju Hyuck ^c  

^a Hanyang University   (South Korea)

^b Hanseo University   (South Korea)

^c SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BARIUM COMPOUNDS; COMPOSITION EFFECTS; CRYSTAL ORIENTATION; ELECTRODES; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; PERMITTIVITY; PRESSURE EFFECTS; RUTHENIUM COMPOUNDS; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

BARIUM STRONTIUM TITANATE; RUTHENIUM DIOXIDE;

DIELECTRIC FILMS;

EID: 2242446140     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006518429998     Document Type: Article

References (15)

1. S.-H. PAEK, J.-H. WON, K.-S. LEE, J.-S. CHOI and C.-S. PARK, Jpn. J. Appl. Phys. 35 (1996) 5757.
2. S.-H. PAEK, J.-H. WON, J.-E. JANG, Y.-S. HWANG, J.-P. MAH, J.-S. CHOI, S.-T. AHN, J.-G. LEE and C.-S. PARK, J. Mater. Sci. 31 (1996) 4357.
3. Y.-S. HWANG, S.-H. PAEK and J.-P. MAH, J. Mater. Sci. Lett. 15 (1996) 1030.
4. A. YUUKI, M. YAMAMUKA, T. MAKITA, T. HORIKAWA, T. SHIBANO, N. HIRANO, H. MAETA, N. MIKAMI, K. ONO and H. ABE, in International Electron Device Meeting, Technical Digest (IEEE, New York, 1995) p. 119.
5. K. ABE and S. KOMATSU, Jpn. J. Appl. Phys. 33 (1994) 5297.
6. T. KAWAHARA, M. YAMAMUKA, T. MAKITA, J. NAKA, A. YUUKI, N. MIKAMI and K. ONO, ibid. 33 (1994) 5129.
7. S. SAITO and K. JURAMASU, ibid. 31 (1992) 135.
8. M. WITTMER, J. Vac. Sci. Technol. A 2 (1984) 273.
9. L. KURSIN-ELBAUM and M. WITTMER, J. Electrochem. Soc. 135 (1988) 2610.
10. C. K. KWOK, D. P. VIJAY, S. B. DESU, N. R. PARIKH and E. A. HILL, in Proceedings of the Fourth International Symposium on Integrated Ferroelectrics (International Symposium on Integrated Ferroelectrics, Colorado Springs, 1992) (Gordon and Breach, 1992) p. 412.
11. D.-K. CHOI, J.-Y. CHOI, J.-H. WON and S.-H. PAEK, Mater. Res. Soc. Symp. Proc. 433 (1996) 45.
12. K. SREENIVAS, M. SAYER, T. LAURSEN, J. L. WHITTON, R. PASCUAL, D. J. JOHNSON, D. T. AMM, G. I. SPROULE, D. F. MITCHELL, M. J. GRAHAM, S. C. GUJRATHI and K. OXORN, Mater. Res. Soc. Symp. Proc. 200 (1990) 255.
13. D. P. VIJAY, S. B. DESU and W. PAN, Ferroelectric Thin Film III, 1993 Materials Research Society Symposium Proceedings, edited by E. R. Myers, B. A. Tuttle, S. B. Desu and P. K. Larsen (Materials Research Society, Pittsburgh, PA, 1993) p. 133.
14. H. B. MICHAELSON, J. Appl. Phys. 45 (1977) 4729.
15. M. TOMKIEWICZ, Y. S. HUANG and F. H. POLLAK, J. Electrochem. Soc. 130 (1993) 1514.