The leakage current mechanism of PZT thin films deposited by in-situ sputtering

Journal of Materials Science Letters

Volumn 15, Issue 12, 1996, Pages 1030-1031

  Hwang, Y S ^a   Paek, S H ^a   Mah, J P ^b  

^a Hanyang University   (South Korea)

^b Honam University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; ELECTRODES; LEAD COMPOUNDS; LEAKAGE CURRENTS; SPUTTER DEPOSITION; THIN FILMS; VOLTAGE MEASUREMENT;

LEAD ZIRCONATE TITANATE; POOLE-FRENKEL EMISSION;

DIELECTRIC FILMS;

EID: 0030172003     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00274897     Document Type: Article

References (7)

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3. J. F. SCOTT, B. M. MELNICK, C. A. ARAUJO, L. D. McMILLAN and R. ZULEEZ, Integrated Ferroelectrics ibid. 1 (1992) 323.
4. C. SUDHAMA, J. KIM, J. LEE and V. CHIKARMANE, J. Vac. Sci. Technol. B11 (1993) 1302.
5. M. OHRING, "The materials science of thin films" (Academic Press, 1992) p. 465.
6. W. ANTPOHLER, G. W. DIETZ and M. KLEE, 4th International Conference on Electronic Ceramics and Applications, Vol. 1, 1994, p. 169.
7. H. HU and S. B. KRUPANIDHI, J. Mater. Res. 9 (1994) 1484.