Opportunities and challenges in immersion lithography

Journal of Photopolymer Science and Technology

Volumn 18, Issue 5, 2005, Pages 571-577

  Maenhoudt, M ^a   Vandenberghe, G ^a   Ercken, M ^a   Cheng, S ^a   Leunissen, P ^a   Ronse, K ^a  

^a IMEC   (Belgium)

Author keywords

193nm immersion lithography; Defectivity; Hyper NA; Resist; RET; Top coat

Indexed keywords

EID: 22144491535     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.571     Document Type: Article

References (11)

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