Simulation and fabrication of silicon oxynitride array waveguide grating for optical communication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5723, Issue , 2005, Pages 43-54

  Liu, Wen Jen ^a   Lai, Yin Chieh ^b   Weng, Min Hang ^c   Chen, Chih Min ^b   Lee, Peng Hsiao ^a  

^a I SHOU UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

Arrayed waveguide grating (AWG); DWDM; Optical communication; PECVD; Silicon oxynitride

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; INDUCTIVELY COUPLED PLASMA; INSERTION LOSSES; OPTICAL COMMUNICATION; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; WAVEGUIDES; WAVELENGTH DIVISION MULTIPLEXING; X RAY PHOTOELECTRON SPECTROSCOPY;

ARRAY WAVEGUIDES; SILICA FILMS; SILICON NITRIDE FILMS; WAVEGUIDE GRATINGS;

SILICON COMPOUNDS;

EID: 21844479270     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.590039     Document Type: Conference Paper

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