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Volumn 61, Issue 3, 2000, Pages 1898-1906

Activated mechanisms in amorphous silicon: An activation-relaxation-technique study

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Indexed keywords


EID: 0000794344     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.61.1898     Document Type: Article
Times cited : (74)

References (29)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.