Molecular Vapor Deposition (MVD) for improved SAM coatings

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5716, Issue , 2005, Pages 151-157

  Kobrin, Boris ^a   Chinn, Jeff ^a   Ashurst, Robert W ^b   Maboudian, Roya ^c  

^a Applied Microstructures Inc   (United States)

^b AUBURN UNIVERSITY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Anti suction coating; MEMS; Molecular Vapor Deposition; MVD; Self assembled monolayer

Indexed keywords

ANTI-STICTION COATING; MOLECULAR LAYER; MOLECULAR VAPOR DEPOSITION (MVD); SUBSTRATE MATERIALS;

CHEMICAL BONDS; COATING TECHNIQUES; MICROELECTROMECHANICAL DEVICES; MONOLAYERS; REACTION KINETICS; SUBSTRATES; SURFACE TREATMENT; VAPOR DEPOSITION;

SELF ASSEMBLY;

EID: 21844444113     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.592627     Document Type: Conference Paper

References (8)

1. Molecular Vapor Deposition (MVD) is a trademark of Applied MicroStructures, Inc.
2. W. R. Ashurst, C. Yau, C. Carraro, R. Maboudian, M. T. Dugger, "Dichlorodimethylsilane as an anti-stiction monolayer for MEMS: a comparison to the octadecyltrichlorosilane self-assembled monolayer", J. Microelectromechanical Systems, 10, 41-49, 2001.
3. T. M. Mayer, M.P. de Boer, N.D. Shinn, P.J. Clews, "Chemical vapor deposition of fluoroalkylsilane monolayer films", J. Vac. Sci. Technol. (B), 18, 2433-2440, 2000.
4. W. R. Ashurst, C. Carraro, R. Maboudian, W. Frey, "Wafer level anti-stiction coatings for MEMS", Sensors and Actuators (A), 104, 213-221, 2003.
5. Thesis, Elizabeth Parker, DC-Berkeley, 2004. (eparker@kcp.com)
6. Patent Pending, Applied MicroStructures, Inc.
7. Lier, K.P., The Chemistry of Silica, John Wiley and Sons, New York, 1979
8. Unpublished work: W.R. Ashurst - UC Berkeley (Currently at Auburn University)