Microstructured polymer films by X-ray lithographic exposure and grafting

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 236, Issue 1-4, 2005, Pages 449-455

  Gürsel, Selmiye A ^a   Padeste, Celestino ^a   Solak, Harun H ^a   Scherer, Günther G ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

ETFE; FEP; Microstructure; Patterning; Radiation grafting; X ray lithography

Indexed keywords

BOUNDARY CONDITIONS; LITHOGRAPHY; MAPPING; MICROSTRUCTURE; MODIFICATION; OPTICAL PROPERTIES; THIN FILMS; X RAYS;

ENERGY DEPOSITION; PATTERNING; RADIATION GRAFTING; X-RAY LITHOGRAPHY;

GRAFT COPOLYMERS;

EID: 21644444670     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.04.018     Document Type: Conference Paper

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