SCOPUS 정보 검색 플랫폼

Chinese Physics Letters

Volumn 22, Issue 1, 2005, Pages 161-163

A novel reactive gas source and its application to carbon nanotube film deposition

(3) Jiang, Nan a Chen, Han Yuan a Qian, Sheng Fa a

a INSTITUTE OF PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; GLOW DISCHARGES; YARN;

CARBON NANOTUBES FILMS; CONDITION; FILM DEPOSITION; GAS SOURCES; GASEOUS DISCHARGES; ITS APPLICATIONS; NON-UNIFORM; PRESSURE GLOW DISCHARGE; REACTIVE GAS; SAMPLE SURFACE;

ATMOSPHERIC PRESSURE;

EID: 21444449553 PISSN: 0256307X EISSN: None Source Type: Journal
DOI: 10.1088/0256-307X/22/1/046 Document Type: Article

Times cited : (7)

References (15)

1
- 0026369362
- Eliasson B and Kogelschatz U 1991 IEEE Trans. Plasma Sci. 19 1063.
- (1991) IEEE Trans. Plasma Sci. , vol.19 , pp. 1063
- Eliasson, B.¹ Kogelschatz, U.²

2
- 0003903459
- Bristol: Institute of Physics Publishing
- J. R. Roth 1995 Industrial Plasma Engineering: Principles (Bristol: Institute of Physics Publishing) vol 1
- (1995) Industrial Plasma Engineering: Principles , vol.1
- Roth, J.R.¹

3
- 0032022902
- Massines F, Rabehi A, Decomps P, Gadri R B, Segur P and Mayoux C 1998 J. Appl. Phys. 88 2950
- (1998) J. Appl. Phys. , vol.88 , pp. 2950
- Massines, F.¹ Rabehi, A.² Decomps, P.³ Gadri, R.B.⁴ Segur, P.⁵ Mayoux, C.⁶

4
- 0023843904
- Masuda S, Akutsu K, Kuruoda M, Awatsu Y and Shibuya Y 1988 IEEE Trans. Indust. Appl. 24 223
- (1988) IEEE Trans. Indust. Appl. , vol.24 , pp. 223
- Masuda, S.¹ Akutsu, K.² Kuruoda, M.³ Awatsu, Y.⁴ Shibuya, Y.⁵

5
- 79955999186
- Simor M, Rahel J, Vojtek P, Cernak M and Brablec A 2002 Appl. Phys. Lett. 81 2716
- (2002) Appl. Phys. Lett. , vol.81 , pp. 2716
- Simor, M.¹ Rahel, J.² Vojtek, P.³ Cernak, M.⁴ Brablec, A.⁵

6
- 0037472671
- Foest R, Adler F, Sigeneger F and Schmidt M 2003 Surf. Coat. Technol. 163-164 323
- (2003) Surf. Coat. Technol. , vol.163-164 , pp. 323
- Foest, R.¹ Adler, F.² Sigeneger, F.³ Schmidt, M.⁴

7
- 0037426519
- Ward L J, Schofield W C E, Badyal J P S, Goodwin A J and Merlin P J 2003 Chem. Mater. 15 1466
- (2003) Chem. Mater. , vol.15 , pp. 1466
- Ward, L.J.¹ Schofield, W.C.E.² Badyal, J.P.S.³ Goodwin, A.J.⁴ Merlin, P.J.⁵

8
- 0033877240
- Kataoka Y, Kanoh M, Makino N, Suzuki K, Saitoh S, Miyajima H and Mori Y 2000 Jpn. J. Appl. Phys. Part I 39 294
- (2000) Jpn. J. Appl. Phys. Part I , vol.39 , pp. 294
- Kataoka, Y.¹ Kanoh, M.² Makino, N.³ Suzuki, K.⁴ Saitoh, S.⁵ Miyajima, H.⁶ Mori, Y.⁷

9
- 0035465659
- Lee Y H, Yi C H, Chung M J, Yeom G Y 2001 Surf. Coat. Technol. 146 474
- (2001) Surf. Coat. Technol. , vol.146 , pp. 474
- Lee, Y.H.¹ Yi, C.H.² Chung, M.J.³ Yeom, G.Y.⁴

10
- 0033750479
- Kelly-Wintenberg K, Sherman D M, Tsai P P-Y, Gadri R B, Karakaya F, Chen Z, Roth J R and Montie T C 2000 IEEE Trans. Plasma Sci. 28 64
- (2000) IEEE Trans. Plasma Sci. , vol.28 , pp. 64
- Kelly-Wintenberg, K.¹ Sherman, D.M.² Tsai, P.P.-Y.³ Gadri, R.B.⁴ Karakaya, F.⁵ Chen, Z.⁶ Roth, J.R.⁷ Montie, T.C.⁸

11
- 0842290115
- Moon S Y, Choe W and Kang B K 2004 Appl. Phys. Lett. 84 188
- (2004) Appl. Phys. Lett. , vol.84 , pp. 188
- Moon, S.Y.¹ Choe, W.² Kang, B.K.³

12
- 0035973345
- Jiang N, Qian S F, Wang L and Zhang H X 2001 Thin Solid Films 390 119
- (2001) Thin Solid Films , vol.390 , pp. 119
- Jiang, N.¹ Qian, S.F.² Wang, L.³ Zhang, H.X.⁴

13
- 0037038690
- Nozaki T, Kimura Y and Okazaki K 2002 J. Phys. D: Appl. Phys. 35 2779
- (2002) J. Phys. D: Appl. Phys. , vol.35 , pp. 2779
- Nozaki, T.¹ Kimura, Y.² Okazaki, K.³

14
- 0037900688
- Ducati C, Alexandrou I, Chhowalla M, Amaratunga G A J and Robertson J 2002 J. Appl. Phys. 92 3299
- (2002) J. Appl. Phys. , vol.92 , pp. 3299
- Ducati, C.¹ Alexandrou, I.² Chhowalla, M.³ Amaratunga, G.A.J.⁴ Robertson, J.⁵

15
- 0000264209
- Li W Z, Zhang H, Wang C Y, Zhang Y, Xu L W, Zhu K and Xie S S 1997 Appl. Phys. Lett. 70 2684
- (1997) Appl. Phys. Lett. , vol.70 , pp. 2684
- Li, W.Z.¹ Zhang, H.² Wang, C.Y.³ Zhang, Y.⁴ Xu, L.W.⁵ Zhu, K.⁶ Xie, S.S.⁷

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.