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Applied Physics A: Materials Science and Processing

Volumn 67, Issue 3, 1998, Pages 347-352

Photoablation and microstructuring of polyestercarbonates and their blends with a XeCl excimer laser

(4) Kunz, Th a Stebani, J b Ihlemann, J c Wokaun, A a,d

a PAUL SCHERRER INSTITUTE (Switzerland)

b BAYER AG (Germany)

c LASER LABORATORIUM GÖTTINGEN E V (Germany)

d ETH ZURICH (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC POLYMERS; ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; ETCHING; EXCIMER LASERS; LASER ABLATION; MICROSTRUCTURE; PHOTOLITHOGRAPHY; POLYCARBONATES; POLYESTERS; POLYMER BLENDS;

EXCIMER ABLATION LITHOGRAPHY (EAL); POLYESTERCARBONATES;

SEMICONDUCTING POLYMERS;

EID: 0032156092 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050782 Document Type: Article

Times cited : (20)

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