Developing novel photoresists: Micro structuring of triazene containing copolyester films

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 899-904

  Hahn, Ch ^a   Kunz, Th ^a   Dahn, U ^c   Nuyken, O ^c   Wokaun, A ^a,b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b ETH ZURICH   (Switzerland)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Ablation; Copolyester; Microstructuring; Photopolymers; Triazene

Indexed keywords

COMPOSITION EFFECTS; COPOLYMERS; DECOMPOSITION; LASER ABLATION; LIGHT ABSORPTION; MICROSTRUCTURE; MOLECULAR STRUCTURE; NITROGEN COMPOUNDS; PHOTOCHEMICAL REACTIONS; PHOTOSENSITIVITY; PLASTIC FILMS; POLYESTERS;

ABSORPTION COEFFICIENTS; CHROMOPHORES; MICROTECHNOLOGY; PHOTOPOLYMERS; TRIAZENE;

PHOTORESISTS;

EID: 0032069498     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00764-2     Document Type: Article

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