Micro structure of N-implanted Ti thin films prepared by ion beam sputtering deposition

Ceramic Transactions

Volumn 148, Issue , 2004, Pages 155-162

  Muraishi, Shinji ^a   Aizawa, Tatsuhiko ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; ION IMPLANTATION; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PRESSURE EFFECTS; SYNTHESIS (CHEMICAL); TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL SHIFT; COLUMNAR GRAINS; DIFFRACTION PATTERNS; ION ENERGY;

THIN FILMS;

EID: 2142763870     PISSN: None     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (8)

1. K. Hiramatsu, H. Ohnishi, T. Takahama and K. Yamanishi, "Formation of TiN films with low Cl concentration by pulsed plasma chemical vapor deposition", Journal of Vacuum Science Technology A 14 [3] 1037-1040 (1995).
2. E. Galvanetto, F. P. Galliano, F. Borgioli, U. Bardi and A. Lavachi, "XRD and XPS Study on Reactive Plasma Sprayed Titanium-Titanium Nitride Coatings", Thin Solid Films 384 223-229 (2002).
3. A. Mitsuo and T. Aizawa, "Effect of Chlorine Distribution Profiles on Tribological Properties for Chlorine-implanted Titanium nitride films", Surface and Coating Technology 158-159 694-698 (2002).
4. Y. Kasukabe, A. Ito, S. Nagata, M. Kishimoto, Y. Fujino, S. Yamaguchi and Y. Yamada, "Control of Epitaxial Orientation of TiN Thin Films Grown by N-implantation", Applied Surface Science 130-132 643-650 (1998).
5. P. Scardi, M. Leoni and R. Checchetto, "Residual Strain in Deuterated Ti thin Films", Matterials Letters 36 1-6 (1998)
6. T. Stark, L. Gutowski, M. Herden, H. Grunleitner, S. Kohler, M. Hundhausen and L. Ley, "Ti-silicide formation during isochronal annealing followed by in situ ellipsometry", Microelectronic Engineering 55 101-107 (2001).
7. K. Terada, K. Matsushita and T. Minegishi, "XPS Analysis of Titanium Nitride and Zirconium Nitride Compound Thin Layer Formed by Nitrogen Ion Implantation", The Journal of The Surface Finishing Society of Japan 43 [1] 19-23 (1992).
8. P. Y. Jouan, M. C. Peignon, Ch. Cardinaud and G. Lemperiere, "Characterisation of TiN Coatings and of the Ti/Si Interface by X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy", Applied Surface Science 68 595-603 (1993)