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Volumn 6, Issue 5-7, 1997, Pages 537-541

Characterization and optimization of mid-frequency plasma-enhanced chemical vapour deposited carbon films using response surface methodology

Author keywords

Characterization; Chemical vapour deposition; Diamond like carbon; Response surface methodology

Indexed keywords


EID: 0009955080     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00713-3     Document Type: Article
Times cited : (11)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.