(Zr, Sn)TiO 4 thin films for application in electronics

Applied Surface Science

Volumn 247, Issue 1-4, 2005, Pages 169-174

  Nistor, M ^a   Gherendi, F ^a   Magureanu, M ^a   Mandache, N B ^a   Ioachim, A ^b   Banciu, M G ^b   Nedelcu, L ^b   Popescu, M ^b   Sava, F ^b   Alexandru, H V ^c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^c UNIVERSITY OF BUCHAREST   (Romania)

Author keywords

Pulsed electron deposition; Thin films; Zirconium tin titanate

Indexed keywords

ALUMINA; ANNEALING; CRYSTALLIZATION; DEPOSITION; ELECTRON BEAMS; LATTICE CONSTANTS; MORPHOLOGY; SOLID SOLUTIONS; STOICHIOMETRY;

CHANNEL SPARK DISCHARGES; DIELECTRIC RESONATORS; PULSED ELECTRON DEPOSITION; ZIRCONIUM TIN TITANATE;

THIN FILMS;

EID: 21144445778     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.01.124     Document Type: Article

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