Light emission and charge trapping in Er-doped silicon dioxide films containing silicon nanocrystals

Applied Physics Letters

Volumn 86, Issue 15, 2005, Pages 1-3

  Nazarov, A ^a,b   Sun, J M ^a   Skorupa, W ^a   Yankov, R A ^a   Osiyuk, I N ^b   Tjagulskii, I P ^b   Lysenko, V S ^b   Gebel, T ^c  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

^c Nanoparc GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; COMPUTER AIDED ANALYSIS; DOPING (ADDITIVES); ELECTROLUMINESCENCE; ERBIUM; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SILICA;

CHARGE TRAPS; LUMINESCENT CENTERS; NANOCLUSTERS; SILICON DIOXIDE FILMS;

SEMICONDUCTING FILMS;

EID: 20844432187     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1872208     Document Type: Article

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