Intrinsic stress induced by substrate bias in amorphous hydrogenated silicon thin films

Surface and Coatings Technology

Volumn 198, Issue 1-3 SPEC. ISS., 2005, Pages 156-160

  Yin, Y ^a   McKenzie, D ^a   Bilek, M ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Intrinsic stress; Substrate bias; Thin films

Indexed keywords

AMORPHOUS SILICON; DATA ACQUISITION; HYDROGENATION; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMAL EFFECTS;

AMORPHOUS HYDROGENATED SILICON THIN FILMS; DEPOSITION RATE; STRESS MODELS;

THIN FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 20744459160     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.10.040     Document Type: Article

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