Effect of nanoscale surface morphology on the phase stability of 3C-AlN films on Si(111)

Journal of Applied Physics

Volumn 97, Issue 11, 2005, Pages

  Lebedev, V ^a   Cimalla, V ^a   Kaiser, U ^a   Foerster, Ch ^a   Pezoldt, J ^a   Biskupek, J ^a   Ambacher, O ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACE MORPHOLOGY; MACROSCOPIC STRESS; NANOSCALE SURFACE MORPHOLOGY; PHASE STABILITY;

ALUMINUM NITRIDE; CARBONIZATION; ENERGY GAP; INTERFACES (MATERIALS); LIGHT EMITTING DIODES; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NUCLEATION; SEMICONDUCTOR LASERS; SILICON; SILICON CARBIDE; STRAIN; SUPERSATURATION;

THIN FILMS;

EID: 20744432498     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1915535     Document Type: Article

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