Effect of ultraviolet radiation exposure on room-temperature hydrogen sensitivity of nanocrystalline doped tin oxide sensor incorporated into microelectromechanical systems device

Journal of Applied Physics

Volumn 97, Issue 5, 2005, Pages

  Shukla, Satyajit ^a   Agrawal, Rajnikant ^a   Cho, Hyoung J ^a   Seal, Sudipta ^a   Ludwig, Lawrence ^b   Parish, Clyde ^b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b KENNEDY SPACE CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; HYDROGEN SENSITIVITY; PHOTOCATALYTIC OXIDATION; SENSOR RESISTANCE;

CHEMICAL SENSORS; DOPING (ADDITIVES); ELECTRIC RESISTANCE; HYDROGEN; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; OXIDATION; PHOTOCATALYSIS; POLYCRYSTALLINE MATERIALS; POROSITY; THIN FILMS; TIN COMPOUNDS;

ULTRAVIOLET RADIATION;

EID: 20444483657     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1851597     Document Type: Article

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