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Volumn 290-291, Issue , 1996, Pages 34-39
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Residual stress in silicon dioxide thin films produced by ion-assisted deposition
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Author keywords
Ion assisted deposition; Optical properties; Residual stress; Silicon oxide
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Indexed keywords
DENSITY MEASUREMENT (SPECIFIC GRAVITY);
DEPOSITION;
OPTICAL CORRELATION;
RESIDUAL STRESSES;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILICA;
SPECTROPHOTOMETRY;
SUBSTRATES;
THIN FILMS;
INTRINSIC STRESSES;
ION ASSISTED DEPOSITION;
WATER INDUCED STRESSES;
OPTICAL FILMS;
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EID: 0346350533
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(96)09174-2 Document Type: Article |
Times cited : (30)
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References (15)
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