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Volumn 290-291, Issue , 1996, Pages 34-39

Residual stress in silicon dioxide thin films produced by ion-assisted deposition

Author keywords

Ion assisted deposition; Optical properties; Residual stress; Silicon oxide

Indexed keywords

DENSITY MEASUREMENT (SPECIFIC GRAVITY); DEPOSITION; OPTICAL CORRELATION; RESIDUAL STRESSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SPECTROPHOTOMETRY; SUBSTRATES; THIN FILMS;

EID: 0346350533     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09174-2     Document Type: Article
Times cited : (30)

References (15)
  • 3
    • 0042823879 scopus 로고
    • Technical Digest Series, Optical Society of America, Washington DC
    • L. Nouvelot and R. Bosmans, Optical Interference Coating, Vol. 17, Technical Digest Series, 1995, Optical Society of America, Washington DC, p. 275.
    • (1995) Optical Interference Coating , vol.17 , pp. 275
    • Nouvelot, L.1    Bosmans, R.2
  • 7
    • 0042322764 scopus 로고    scopus 로고
    • French Patent 2644180, 1991; US Patent 5074246, 1991
    • French Patent 2644180, 1991; US Patent 5074246, 1991.
  • 15
    • 0041821867 scopus 로고
    • PhD Thesis, Institut National Polytechnique de Grenoble
    • H. Leplan, PhD Thesis, Institut National Polytechnique de Grenoble, 1995.
    • (1995)
    • Leplan, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.