Residual stress analysis in thick uranium films

Journal of Nuclear Materials

Volumn 342, Issue 1-3, 2005, Pages 8-13

  Hodge, A M ^a   Foreman, R J ^a   Gallegos, G F ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; RESIDUAL STRESSES; TENSILE STRESS; THICK FILMS;

BULK MATERIALS; NANOIDENTATION; STRESS EVOLUTION; THICK URANIUM FILMS;

URANIUM;

EID: 20444433590     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2005.03.024     Document Type: Article

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