Ion beam lithography with single ions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5650, Issue , 2005, Pages 381-390

  Alves, A ^a   Hearne, S M ^b   Reichart, P ^b   Siegele, R ^c   Jamieson, D N ^b   Johnston, P N ^a  

^a RMIT UNIVERSITY   (Australia)

^b UNIVERSITY OF MELBOURNE   (Australia)

^c AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

CR 39; High aspect ratio structures; Ion beam lithography; Ion tracks; Latent damage; Nanostencil; Nuclear microprobe; Photonic crystals; PMMA; Proton beam writing; Single ion counting; Track etching

Indexed keywords

ASPECT RATIO; IMAGING SYSTEMS; IONS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; OPTICAL SWITCHES; POLYMETHYL METHACRYLATES; PROTON BEAMS;

CR-39; HIGH ASPECT RATIO STRUCTURES; ION TRACKS; LATENT DAMAGE; NANOSTENCIL; NUCLEAR MICROPROBE; PHOTONIC CRYSTALS; PROTON BEAM WRITING; SINGLE ION COUNTING; TRACK ETCHING;

ION BEAM LITHOGRAPHY;

EID: 20344407574     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.582191     Document Type: Conference Paper

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