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Volumn 830, Issue , 2005, Pages 257-262
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Improved size dispersion of silicon nanocrystals grown in a batch LPCVD reactor
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL REACTORS;
CHEMICAL VAPOR DEPOSITION;
COALESCENCE;
CONTAMINATION;
CRYSTAL GROWTH;
DISPERSIONS;
GATES (TRANSISTOR);
NUCLEATION;
PARTIAL PRESSURE;
PARTICLE SIZE ANALYSIS;
SILICON WAFERS;
THRESHOLD VOLTAGE;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);
NANOCRYSTAL SIZE;
SILANE;
SILICON NANOCRYSTALS;
NANOSTRUCTURED MATERIALS;
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EID: 20344388280
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (6)
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References (4)
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