Nanomachining of inorganic transparent materials using an X-ray exciton method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5662, Issue , 2004, Pages 107-112

  Makimura, Tetsuya ^a   Kenmotsu, Youichi ^a   Miyamoto, Hisao ^a   Mori, Michiaki ^b   Kondo, Kiminori ^c   Murakami, Kouichi ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

Inorganic transparent materials; Laser plasma; Nanomachining; Quartz; Self trapped exciton; Soft X ray; Ultraviolet laser; X ray exciton

Indexed keywords

EXCITONS; IRRADIATION; MICROMACHINING; NEODYMIUM LASERS; QUARTZ; THERMAL EFFECTS; THIN FILMS; TRANSPARENCY; ULTRAVIOLET RADIATION; X RAY DIFFRACTION; X RAY LASERS;

INORGANIC TRANSPARENT MATERIALS; LASER PLASMA; NANOMACHINING; SELF-TRAPPED EXCITONS; SOFT X-RAYS; ULTRAVIOLET LASERS; X-RAY EXCITON;

NANOTECHNOLOGY;

EID: 20344375945     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.596284     Document Type: Conference Paper

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