Electron field emission and surface morphology of a-C and a-C:H thin films

Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 248-252

  Anishchik, V M ^a   Uglov, V V ^a   Kuleshov, A K ^a   Filipp, A R ^a   Rusalsky, D P ^a   Astashynskaya, M V ^a   Samtsov, M P ^a   Kuznetsova, T A ^b   Thiery, F ^c   Pauleau, Y ^c  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

^b POWDER METALLURGY INSTITUTE   (Belarus)

^c GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

Author keywords

a C and a C:H thin films; Field emission; Surface morphology

Indexed keywords

AMORPHOUS MATERIALS; DIAMOND FILMS; ELECTRIC FIELDS; ION BEAMS; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SINGLE CRYSTALS; SURFACES;

A-C AND A-C:H THIN FILMS; CATHODIC-ARC VACUUM DEPOSITION (CAVD); FIELD EMISSION; ION BEAM ASSITANCE;

THIN FILMS;

EID: 20244365490     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.153     Document Type: Conference Paper

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