Surface morphology evolution during LP-MOCVD growth of ZnO on sapphire

Materials Science Forum

Volumn 475-479, Issue III, 2005, Pages 1693-1696

  Ye, J D ^a   Gu, S L ^a   Zhu, S M ^a   Liu, S M ^a   Qin, F ^a   Liu, W ^a   Zhou, X ^a   Zhang, R ^a   Shi, Y ^a   Zheng, Y D ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

Atomic force microscope; Buffer; Morphology; ZnO

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ETCHING; FILM GROWTH; MORPHOLOGY; OPTICAL MICROSCOPY; SAPPHIRE; SURFACE ROUGHNESS; X RAY DIFFRACTION;

ATOMIC FORCE MICROSCOPES; BUFFER; METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); ZNO;

ZINC OXIDE;

EID: 20144387994     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-960-1.1693     Document Type: Conference Paper

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