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Volumn 5564, Issue , 2004, Pages 113-122
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MWIR detectors on HgCdTe grown by MBE on 3-inch diameter silicon substrates
a a a a a b c c c c |
Author keywords
Arsenic implantation; Dynamic impedance; HgCdTe; Mid wavelength infrared (MWIR); Minority carrier lifetime; Molecular beam epitaxy (MBE); Photovoltaic detector; Silicon substrate
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Indexed keywords
ARSENIC IMPLANTATION;
DYNAMIC IMPEDANCE;
HGCDTE;
MID WAVELENGTH INFRARED (MWIR);
MINORITY CARRIER LIFETIME;
PHOTOVOLTAIC DETECTORS;
SILICON SUBSTRATE;
ANNEALING;
ARSENIC;
DIFFUSION;
DOPING (ADDITIVES);
ELLIPSOMETRY;
ION IMPLANTATION;
LOW ENERGY ELECTRON DIFFRACTION;
MATHEMATICAL MODELS;
MERCURY COMPOUNDS;
MOLECULAR BEAM EPITAXY;
PASSIVATION;
HETEROJUNCTIONS;
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EID: 20144373996
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.568012 Document Type: Conference Paper |
Times cited : (8)
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References (8)
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