MOCVD growth and properties of ZnO thin films on LiNbO3 substrates

Journal of Crystal Growth

Volumn 277, Issue 1-4, 2005, Pages 378-381

  Wang, Yinzhen ^a,c   Wang, Haili ^a,c   Liu, Shiliang ^a,c   Liu, Hongxia ^a,c   Zhou, Shengming ^a   Hang, Yin ^a   Xu, Jun ^a   Ye, Jiandong ^b   Gu, Shulin ^b   Zhang, Rong ^b  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b NANJING UNIVERSITY   (China)

^c UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

A1. LiNbO3; A3. Metal organic chemical vapor deposition; B1. ZnO thin film

Indexed keywords

FILM GROWTH; IONIZATION; LIGHT TRANSMISSION; LITHIUM NIOBATE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPACITY; OPTIMIZATION; PHOTOLUMINESCENCE; STOICHIOMETRY; X RAY DIFFRACTION;

LINBO3; POCKELS COEFFICIENTS; SURFACE ACOUSTIC WAVES (SAW); ZNO THIN FILMS;

ZINC OXIDE;

EID: 20144361953     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.01.069     Document Type: Article

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