Evolution of light source technology to support immersion and EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5645, Issue , 2005, Pages 188-195

  Blumenstock, G M ^a   Meinert, C ^a   Farrar, N R ^a   Yen, A ^a  

^a CYMER INC   (United States)

Author keywords

DUV; EUV; Immersion lithography; Lithography; Lithography light source; MOPA

Indexed keywords

DUV; EUV; IMMERSION LITHOGRAPHY; LITHOGRAPHY LIGHT SOURCE; MOPA;

EXCIMER LASERS; OPTICAL DEVICES; OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; PHOTORESISTORS; PLASMA APPLICATIONS; SEMICONDUCTOR DEVICE MANUFACTURE;

LIGHT SOURCES;

EID: 20044388382     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.577587     Document Type: Conference Paper

References (7)

1. T. Ishihara et al., "Long-term Reliable Operation of a MOPA-based ArF Light Source for Microlithography," Proceedings of SPIE International Symposium on Optical Lithography XVII, Santa Clara, CA, USA, Vol. 5377, pp. 1858-1865, February 2004
2. As of Q3 2004, source Cymer, Inc.
3. "Optical Lithography in the sub-50 nm regime", D. G. Flagello, B. Arnold, S. Hansen, M. Dusa, et al., Optical Microlithography XVII, B. Smith (Eds), Santa Clara CA, SPIE Vol. 5377, pp. 21-33, 2004.
4. U. Stamm, et al., "High power EUVsources for lithography - A comparison of laser produced plasma and gas discharge produced plasma", Proc. SPIE 4688, 122-133 (2002).
5. I. V. Fomenkov, R. M. Ness, I. R. Oliver, S. T. Melnychuk, O. V. Khodykin, N. R. Böwering, C. L. Rettig, J. R. Hoffman, "Performance and scaling of a dense plasma focus light source for EUV lithography," Proceedings of SPIE International Symposium on Emerging Lithographic Technologies VII, Santa Clara, CA, USA, Vol. 5037, pp. 807-821, February 2003
6. Presented at the SEMI Litho Forum, Los Angeles CA, January 2004.
7. rd Annual International EUV Symposium, Miyazaki, Japan, November 2004.