Long-term reliable operation of a MOPA-based ArF light source for microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 3, 2004, Pages 1858-1865

  Ishihara, Toshihiko ^a   Besaucele, Herve ^a   Maley, Cynthia ^a   Fleurov, Vladimir ^a   O'Keeffe, Patrick ^a   Haviland, Mary ^a   Morton, Richard ^a   Gillespie, Walter ^a   Dyer, Tim ^a   Moosman, Bryan ^a   Poole, Robert ^a  

^a CYMER INC   (United States)

Author keywords

193nm light source; DUV; Excimer laser; Microlithography; MOPA; Narrow bandwidth

Indexed keywords

BANDWIDTH; LASER BEAMS; LIGHT SOURCES; LITHOGRAPHY; OSCILLATORS (ELECTRONIC); POWER AMPLIFIERS; SCANNING;

ANAMORPHIC BEAMS; OPTICAL DELAY LINES; OPTICAL PERFORMANCE;

EXCIMER LASERS;

EID: 3843092651     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535614     Document Type: Conference Paper

References (2)

1. R. Sandstrom, A. Ershov, V. Fleurov, "MOPA Laser Architecture for High Power Lithographic Light Sources" SPIE 27'th Conference on Microlithography, March 3-8, 2002, Santa Clara, AC, USA
2. V. Fleurov, et al, "Dual Chamber Ultra Line-Narrowed Excimer Light Source for 193nm Lithography", Optical Microlithography XVI, 2003, SPIE, Volume 5040, pp1694-1703.