Ni thin film deposition from tetrakistrifluorophosphine-nickel

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 8-11, 2005, Pages

  Ohshita, Yoshio ^a   Ishikawa, Masato ^b   Kada, Takeshi ^b   Machida, Hideaki ^b   Ogura, Atsushi ^c  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b TRI Chemical Laboratory Inc   (Japan)

^c MEIJI UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition (CVD); Inorganic source; Nickel

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CORROSION RESISTANCE; DEPOSITION; NICKEL; NICKEL COMPOUNDS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PROTECTIVE COATINGS; SOLUTIONS; SPUTTERING; SYNTHESIS (CHEMICAL); VAPOR PRESSURE;

CORROSION RESISTANT COATINGS; DEPOSITION TECHNOLOGY; INORGANIC SOURCES; REACTION SYSTEMS;

THIN FILMS;

EID: 19944413116     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.L315     Document Type: Article

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