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Volumn 234, Issue 1-2, 2005, Pages 40-46
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Tailoring of silicon crystals for relativistic-particle channeling
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Author keywords
Channeling; Micromachining; Surface treatments
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CRYSTALS;
DISLOCATIONS (CRYSTALS);
ETCHING;
FILMS;
HYDROFLUORIC ACID;
HYDROGEN PEROXIDE;
MICROMACHINING;
OPTICAL COLLIMATORS;
SILICON;
STRESS ANALYSIS;
SURFACE TREATMENT;
BENT CRYSTALS;
CHANNELLING;
CHEMICAL ETCHING;
SILICON CRYSTALS;
HIGH ENERGY PHYSICS;
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EID: 19944406525
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2005.01.008 Document Type: Conference Paper |
Times cited : (43)
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References (25)
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