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Volumn 234, Issue 1-2, 2005, Pages 40-46

Tailoring of silicon crystals for relativistic-particle channeling

Author keywords

Channeling; Micromachining; Surface treatments

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALS; DISLOCATIONS (CRYSTALS); ETCHING; FILMS; HYDROFLUORIC ACID; HYDROGEN PEROXIDE; MICROMACHINING; OPTICAL COLLIMATORS; SILICON; STRESS ANALYSIS; SURFACE TREATMENT;

EID: 19944406525     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.01.008     Document Type: Conference Paper
Times cited : (43)

References (25)
  • 13
    • 19944386832 scopus 로고    scopus 로고
    • A.V. Korol, A.V. Solov'yov, W. Greiner, available at:
    • A.V. Korol, A.V. Solov'yov, W. Greiner, available at: < arxiv:physics/0403082>
  • 19
    • 19944394130 scopus 로고    scopus 로고
    • private communication
    • Yu.M. Ivanov, private communication
    • Ivanov, Yu.M.1
  • 22
    • 19944398998 scopus 로고    scopus 로고
    • Washington Technology Center (microfab.watechcenter.org/media/TechReport/ Silicon%20Nitride.pdf)
    • E. Miller, Low Stress Silicon Nitride Process Development, Washington Technology Center (microfab.watechcenter.org/media/TechReport/Silicon%20Nitride. pdf)
    • Low Stress Silicon Nitride Process Development
    • Miller, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.