MEEF-based mask inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 98-106

  Maurer, Wilhelm ^a   Word, James ^a   Schulze, Steffen ^a   Shang, Shumay ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Mask inspection; MEEF; OPC

Indexed keywords

BOOLEAN ALGEBRA; COMPUTER SIMULATION; DATA REDUCTION; IMAGE PROCESSING; PARAMETER ESTIMATION; PHASE SHIFT;

DO NOT INPECT REGIONS (DNIR); MASK ERROR ENHANCEMENT FACTOR (MEEF); MASK INSPECTION; OPC;

INTEGRATED CIRCUITS;

EID: 19844369833     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569330     Document Type: Conference Paper

References (9)

1. rd Annual BACUS Symposium on Photomask Technology, Vol. 5256, p 331, SPIE 2003.
2. st Annual BACUS Symposium on Photomask Technology, Vol. 4562, p. 468, SPIE 2002.
3. rd Annual BACUS Symposium on Photomask Technology, Vol. 5256, p 489, SPIE 2003.
4. rd Annual BACUS Symposium on Photomask Technology, Vol. 5256, p 174, SPIE 2003.
5. The Mentor Graphics website is www.mentor.com/dsm.
6. W. Maurer, K. Satoh, D. Samuels, T. Fischer, "Pattern transfer at k1 = 0.5: Get 0.25mm lithography ready for production", Proc. Optical Microlithography IX, Vol. 2726, p. 113, SPIE (1996)
7. Jim Wiley: "Effect of Stepper Resolution on the Printability of Submicron 5x Reticle Defects", Proc. Optical & Laser Microlithography III, Vol. 1088, p. 58, SPIE 1989.
8. J. Sturtevant, J. Opitz, J. Word, "Contact-hole MEEF comparison between ALTA and 50-KeV written masks", Proc. Optical Microlithography XVI, Vol. 5040, p. 1055, SPIE 2003
9. S. Shang, Y. Granik, N. Cobb, W. Maurer, Y. Cui, L. Liebmann, J. Oberschmidt, R. Singh, B. Vampatella, "Failure prediction across process window for robust OPC", Proc. Optical Microlithography XVI, Vol. 5040, p. 431, SPIE 2003