Integrating design data with manufacturing data: Why you want to use a universal data model (UDM)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 174-184

  Erck, Wesley R ^a  

^a Wes Erck and Associates   (United States)

Author keywords

Mask Data Preparation; MDP; OASIS; SEMI P10; UDM; Universal Data Model

Indexed keywords

COMPUTATIONAL COMPLEXITY; COMPUTER AIDED DESIGN; DATABASE SYSTEMS; ENCAPSULATION; MASKS; MATHEMATICAL MODELS; MICROPROCESSOR CHIPS; PHOTOLITHOGRAPHY;

MASK DATA PREPARATION; MDP; OASIS; SEMI P10; UDM; UNIVERAL DATA MODEL;

DATA REDUCTION;

EID: 1842475783     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518277     Document Type: Conference Paper

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