Defect printability analysis of attenuated PSM using PASS™

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 468-479

  Maenaka, Yumiko ^a   Takatsu, Norihiko ^a   Kagami, Ichiro ^b   Kakuta, Daichi ^b  

^a KLA TENCOR CORPORATION   (United States)

^b SONY CORPORATION   (Japan)

Author keywords

AttPSM; PASS; Simulation; Virtual Stepper

Indexed keywords

COMPUTER SIMULATION; DEFECTS; ELECTROMAGNETIC WAVE ATTENUATION; IMAGE PROCESSING; PHASE SHIFT; PRINTING;

PHASE SHIFT MASKS (PSM);

MASKS;

ATTENUATION; DEFECTS; PRINTING;

EID: 0035763797     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458322     Document Type: Article

References (1)

1. Ichiro Kagami, "A Study on Photomask Defect Printability and Quality Assurance for 0.13μm Technology", Yield Management Seminar, Makuhari, Japan, December 2000.