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Volumn 5567, Issue PART 2, 2004, Pages 887-893

Immersion mask inspection with hybrid-microscopic systems at 193 nm

Author keywords

Diffractive optics; High resolution microscopy; Hybrid optics; Solid immersion lens

Indexed keywords

DIFFRACTIVE OPTICS; LENSES; LIGHT SOURCES; MASKS; MICROSCOPIC EXAMINATION; PHASE SHIFT;

EID: 19844363510     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569019     Document Type: Conference Paper
Times cited : (9)

References (5)
  • 1
    • 3843070886 scopus 로고    scopus 로고
    • Aerial image measurement technique for today's and future 193 nm lithography mask requirements
    • A.M. Zibold, T. Scherübl, A. Menck, R. Brunner, J. Greif, Aerial Image Measurement Technique for Today's and Future 193 nm Lithography Mask requirements; Proc. SPIE Vol. 5504 (2004) 12-18
    • (2004) Proc. SPIE , vol.5504 , pp. 12-18
    • Zibold, A.M.1    Scherübl, T.2    Menck, A.3    Brunner, R.4    Greif, J.5
  • 2
    • 2342572369 scopus 로고    scopus 로고
    • Diffractive-refractive hybrid microscope objective for 193 nm inspection system
    • R. Brunner, R. Steiner, K. Rudolf, and H.-J. Dobschal, Diffractive-Refractive Hybrid Microscope Objective for 193 nm Inspection System, Proc. SPIE Vol. 5177 (2003) 9-15
    • (2003) Proc. SPIE , vol.5177 , pp. 9-15
    • Brunner, R.1    Steiner, R.2    Rudolf, K.3    Dobschal, H.-J.4
  • 3
    • 1842608735 scopus 로고    scopus 로고
    • Microscope objective production: On the way from the micrometer scale to the nanometer scale
    • T. Sure, J. Heil, and J. Wesner, Microscope objective production: On the way from the micrometer scale to the nanometer scale, Proc. SPIE Vol. 5180 (2003) 283-292
    • (2003) Proc. SPIE , vol.5180 , pp. 283-292
    • Sure, T.1    Heil, J.2    Wesner, J.3
  • 4
    • 0030709847 scopus 로고    scopus 로고
    • Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS
    • R. A. Budd, D. B. Dove, J. L. Staples, r. M. Martino, R. A. Ferguson, and J. T. Weed, Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS, IBM J. Res. Develop. 41 (1/2) (1997) 119-129
    • (1997) IBM J. Res. Develop. , vol.41 , Issue.1-2 , pp. 119-129
    • Budd, R.A.1    Dove, D.B.2    Staples, J.L.3    Martino, R.M.4    Ferguson, R.A.5    Weed, J.T.6
  • 5
    • 0000251833 scopus 로고    scopus 로고
    • Fields associated with the solid immersion lens
    • G. S. Kino, Fields associated with the solid immersion lens, Proc. SPIE Vol. 3467 (1998) 128-137
    • (1998) Proc. SPIE , vol.3467 , pp. 128-137
    • Kino, G.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.