Aerial image measurement technique for today's and future 193nm lithography mask requirements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5504, Issue , 2004, Pages 12-18

  Zibold, A M ^a   Scherubl T ^a   Menck, A ^a   Brunner, R ^a   Greif, J ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; IMAGE ANALYSIS; LASER BEAMS; LIGHTING; MASKS; OPTICAL SYSTEMS; PHASE SHIFT; PHOTOLITHOGRAPHY; POLARIZATION; SCANNING;

BEAM HOMOGENIZER; BINARY CHROME MASKS; OPTICAL SETTINGS; STEPPERS;

PHOTOGRAMMETRY;

EID: 3843070886     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568016     Document Type: Conference Paper

References (9)

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