Diffractive-Refractive Hybrid Microscope Objective for 193 nm Inspection Systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5177, Issue , 2003, Pages 9-15

  Brunner, Robert ^a   Steiner, Reinhard ^a   Rudolf, Klaus ^a   Dobschal, Hans Jürgen ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

Deep UV; Diffractive optics; Hybrid optics; Mask inspection

Indexed keywords

BANDWIDTH; CALCIUM COMPOUNDS; DIFFRACTION; FUSED SILICA; LITHOGRAPHY; OPTICAL INSTRUMENT LENSES; REACTIVE ION ETCHING;

DEEP-CV; HYBRID OPTICS; MASK INSPECTION; MICROLITHOGRAPHY SIMULATION MICROSCOPY (MSM);

DIFFRACTIVE OPTICS;

EID: 2342572369     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.498325     Document Type: Conference Paper

References (2)

1. Kenji Ono; United States Patent; Patent No.: US 6,392,814 B1 (2002)
2. W. Vollrath; United States Patent; Patent No.: US 5,440,422 (1995)