Anelasticity and damping of thin aluminum films on silicon substrates

Journal of Microelectromechanical Systems

Volumn 13, Issue 2, 2004, Pages 230-237

  Choi, Dae Han ^a   Kim, Hyungsub ^a   Nix, William D ^a  

^a Stanford University   (United States)

Author keywords

Aluminum; Anelasticity; Damping; Diffusion; Thin films

Indexed keywords

DAMPING; DIFFUSION; ELASTICITY; GRAIN BOUNDARIES; INTERFEROMETRY; INTERNAL FRICTION; RELAXATION PROCESSES; STRAIN RATE; THERMAL EFFECTS; THICKNESS MEASUREMENT; THIN FILMS; VIBRATIONS (MECHANICAL);

ANELASTICITY; FREE STANDING BILAYER; FREE STANDING CANTILEVERS; THIN ALUMINUM FILMS;

ALUMINUM;

EID: 1942532723     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2004.825290     Document Type: Article

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