Design and fabrication of zinc oxide thin-film ridge waveguides on silicon substrate with ultraviolet amplified spontaneous emission

IEEE Journal of Quantum Electronics

Volumn 40, Issue 4, 2004, Pages 406-412

  Yu, S F ^a   Yuen, Clement ^a   Lau, S P ^a   Fan, W J ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Amplified spontaneous emission; Filtered cathodic vacuum arc technique; Optical waveguide; Ultraviolet emission; Zinc oxide

Indexed keywords

PLASMA ETCHING; SEMICONDUCTING SILICON; SPONTANEOUS EMISSION; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS; ZINC OXIDE;

FILTERED CATHODIC VACUUM ARC TECHNIQUE; ULTRAVIOLET AMPLIFIED SPONTANEOUS EMISSION; ZINC OXIDE THIN-FILM RIDGE WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 1942424884     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/JQE.2004.825212     Document Type: Article

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