Dielectric film deposition for optical applications

Vide: Science, Technique et Applications

Volumn 1999, Issue 291, 1999, Pages 58-72

  Callard, S ^a   Masenelli, B ^a   Gagnaire, A ^a   Joseph, J ^a  

^a INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

Author keywords

In situ spectroellipsometry; Optical filter; Plasma deposition; Silicon oxynitride; Titanum oxide

Indexed keywords

EID: 19044391689     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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