Nanowire coating by plasma processing

IEEE Transactions on Plasma Science

Volumn 33, Issue 2 II, 2005, Pages 829-833

  Cao, Jin ^a,b   Matsoukas, Themis ^a  

^a The Pennsylvania State University   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

Materials processing; Plasma applications; Plasma CVD; Thin films; Vapor deposition

Indexed keywords

AMORPHOUS FILMS; COATINGS; GOLD; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

MATERIALS PROCESSING; METALLIC NANOWIRES; PLASMA PROCESSING;

PLASMA APPLICATIONS;

EID: 18844418942     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2005.844505     Document Type: Article

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