Morphological development at the interface of polymer/polymer bilayer with an in-situ compatibilizer under electric field

Macromolecules

Volumn 38, Issue 9, 2005, Pages 3820-3827

  Kho, Dong Han ^a   Chae, Seung Hun ^a   Jeong, Unyong ^a   Kim, Hwang Yong ^a   Kim, Jin Kon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; CARBOXYLIC ACIDS; ELECTRIC FIELD EFFECTS; INTERFACES (MATERIALS); MORPHOLOGY; POLYMETHYL METHACRYLATES; POLYSTYRENES; SURFACE TENSION;

CHAIN ARCHITECTURE; INTERFACIAL INSTABILITY; MORPHOLOGICAL DEVELOPMENT; REACTIVE BILAYERS;

THIN FILMS;

EID: 18844403638     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma0495846     Document Type: Article

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